Apparatus for laser-discharge imaging and focusing elements...

G - Physics – 02 – B

Patent

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Details

G02B 7/04 (2006.01) B41J 2/315 (2006.01) B41J 2/46 (2006.01) B41M 1/06 (2006.01) G02B 3/04 (2006.01) G02B 6/32 (2006.01) G02B 6/42 (2006.01) G02B 27/00 (2006.01) B41C 1/10 (2006.01)

Patent

CA 2196738

A focusing assembly includes features that allow numerical aperture to be reduced and optimized by reducing aberrations and ghost reflections and easily controlling stop size, thereby increasing depth-of-focus. The assembly includes a single, bi-aspheric focusing lens that optimizes image quality at a specific off-axis field point. Passage of excessively divergent radiation is prevented by a baffle having a sharp, flared edge that minimizes reflection. A second aperture or baffle can be included to restrict high-divergence radiation emerging from the bi-aspheric focusing lens. All interior surfaces of the focusing assembly are preferably blackened, once again to minimize internal reflections.

Système de mise au point comportant des caractéristiques permettant la réduction et l'agrandissement de l'ouverture numérique en réduisant les aberrations et les réflexions fantômes et en contrôlant facilement la taille d'ouverture, ce qui accroît la profondeur du foyer. Le système comprend une lentille asphérique simple, qui optimise la qualité de l'image en un point hors-axe précis du champ. Le passage de rayons divergents est évité au moyen d'un déflecteur à bord affilé et évasé, qui diminue la réflexion. Une deuxième ouverture ou un deuxième déflecteur peut être inclus pour limiter les rayonnements de la lentille asphérique. Toutes les surfaces intérieures du système de mise au point sont préférablement noires, également pour minimiser les réflexions internes.

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