C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 13/24 (2006.01) B01D 15/04 (2006.01) B01J 47/00 (2006.01) B01J 47/14 (2006.01) B05D 7/14 (2006.01)
Patent
CA 2154679
A system automated for providing at least periodic removal of metal ions and contaminants from a chemical bath (T4), consists of a microprocessor programmed for controlling fluid circuits of pumps (P1, P2, P3) and valves (AV1, AV2, AV3, AV4, AV5, AV6, AV7), for in one state of operation circulating a first predetermined quantity of the chemical bath from a first tank (T4), through an ion exchange column, and back to the first tank; for in a second state of operation circulating deionized water from a second tank (T1), into the IEX column for displacing residual chemical bath therefrom for return to the first tank; for in a third state of operation circulating deionized water through the IEX column, and discharging the rinse water from a waste port; for in a fourth state of operation circulating regenerant acid (T2) through the ion exchange column, and discharging the used acid from a waste port; for in a fifth state of operation circulating, deionized water through the IEX column for rinsing acid regenerant therefrom and discharging the same out of a waste port; and for in a sixth state of operation circulating chemical bath into the IEX column for displacing residual rinse water therefrom, and discharging the same out of the waste port, in preparation for a cycle of treatment of the chemical bath.
Kozak William G.
Topping Joseph C.
Fetherstonhaugh & Co.
Henkel Corporation
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