H - Electricity – 01 – J
Patent
H - Electricity
01
J
H01J 17/20 (2006.01) H01J 9/24 (2006.01) H01J 9/38 (2006.01) H01J 17/49 (2006.01)
Patent
CA 2479546
An apparatus for manufacturing a rear substrate for a plasma display panel. The plasma display panel includes a plating tank, a diaphragm formation means mounted at both sidewalk of the plating tank . The diaphragm formation means having concave and convex parts continuously formed on the outer circumference for forming diaphragms projected on the rear substrate. Rear substrate formation means are mounted to cover the outer circumference of the diaphragm formation means contained in the plating tank while maintaining a predetermined space with the outer circumference of the diaphragm formation means, for forming the rear substrate. A plating solution supply means is provided for supplying a plating solution to the space formed between the diaphragm formation means and the rear substrate formation means through the rear substrate formation means, wherein an electrode is applied to each of the diaphragm formation means and the rear substrate formation means.
Cho Chul R.
Cho Sick
Cho Chul R.
Song Byung S.
Thompson Douglas B.
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