Apparatus for manufacturing semiconductor wafers

Details Apparatus for manufacturing semiconductor wafers Apparatus for manufacturing semiconductor wafers

H - Electricity

01

L

H01L 21/20 (2006.01) H01L 21/687 (2006.01)

Patent

CA 2080028

Apparatus for semiconductor wafer manufacture in which a susceptor has an annular rotor for supporting a wafer substrate with a substrate surface facing downwards. The rotor has an annular flange overlying a body of the susceptor and the structure is such that a flow of rotor driving gas may be directed up from the body and against the flange while crystalline layers are being formed on the undersurface of the substrate.

Installation pour la fabrication de plaquettes dans laquelle un suscepteur est doté d'un rotor annulaire pour supporter le substrat dont la surface est orientée vers le bas. Le rotor possède un rebord annulaire sus-jacent au corps du suscepteur et la structure est telle que le gaz d'entraînement du rotor peut être dirigé vers le haut et vers le rebord durant le processus de formation des couches cristallines à l'intrados du substrat.

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