Apparatus for measuring the thickness of a thin film

Details Apparatus for measuring the thickness of a thin film Apparatus for measuring the thickness of a thin film

G - Physics

01

B

354/25

G01B 11/06 (2006.01)

Patent

CA 1323434

- 1 - Abstract: An apparatus for measuring the thickness of a thin film utilizing the interferometric method includes a light source for generating a monochromatic light beam. This light beam is scanned onto the film in such a manner that the incident angle thereto is continuously varied from .alpha. to (-.alpha.). A first detector detects this incident angle of the light beam and a second detector detects an interference pattern caused by light beams reflected from the top and bottom surfaces of the film. The thickness of the film is obtained in accordance with a geometrical optical relation defined between adjacent fringes contained in the detected interference pattern.

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