Apparatus for molecular beam epitaxy

Details Apparatus for molecular beam epitaxy Apparatus for molecular beam epitaxy

H - Electricity

01

L

356/192, 356/194

H01L 21/68 (2006.01) C30B 23/02 (2006.01) C30B 35/00 (2006.01) H01L 21/203 (2006.01)

Patent

CA 1207470

- 1 - Abstract: An apparatus for molecular beam epitaxy is constructed so that a substrate is introduced into a vacuum vessel with the substrate surface for epitaxial growth facing downwards. The substrate is conveyed to and transferred into vacuum chambers for performing processes necessary for the epitaxial growth while the substrate surface is maintained facing downwards and without directly touching the substrate surface. The result is less surface contamination and a higher rate of production of successful products.

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