Apparatus for photomask repair

Details Apparatus for photomask repair Apparatus for photomask repair

G - Physics

03

F

327/1.1

G03F 1/00 (2006.01) B23K 26/12 (2006.01) G03B 41/00 (2006.01)

Patent

CA 1244521

Abstract An apparatus for repairing both clear and opaque defects in a photomask having a metal film pattern on a glass plate in which a visible laser light source is pulsed at selected frequencies to direct an optically focused laser beam into a gas sealed cell containing a mask. At one frequency, the laser pulses ablate opaque mask defects. At another frequency, and with the cell filled with a metal bearing gas, the laser beam causes thermal decomposition of the gas and deposition of metal to cure clear defects.

492237

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