Apparatus for physical vapor deposition

Details Apparatus for physical vapor deposition Apparatus for physical vapor deposition

C - Chemistry, Metallurgy

23

C

204/167

C23C 14/04 (2006.01) C23C 14/56 (2006.01)

Patent

CA 1177638

ABSTRACT OF THE DISCLOSURE An apparatus for physical vapor deposition comprising a vacuum casing one end of which is open; a sealing member provided at the opening of the casing; an electrode for physical vapor deposition, such as a target elec- trode or a electrode for heating evaporation, which is provided in the casing; and an exhaust hole for exhausting gases in the casing, which is provided at a predetermined wall portion of the casing The apparatus may also be provided with a gas introducing hole and a bias electrode The casing is integrally fitted to a body to be treated at the opening end portion thereof by means of the sealing member to for a vacuum chamber therein This apparatus is compact and enables the surface treatment of a large or immovable body without moving the body.

396090

Affiliated with

Also associated with

Rating

Apparatus for physical vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for physical vapor deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for physical vapor deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1309661