H - Electricity – 01 – J
Patent
H - Electricity
01
J
356/176, 356/192
H01J 37/317 (2006.01) H01J 37/18 (2006.01) H01J 37/301 (2006.01) H01L 21/677 (2006.01)
Patent
CA 1294065
ABSTRACT OF THE DISCLOSURE Disclosed is a particle beam lithography system (10) having a workpiece loading/unloading position to one side of a particle beam (32) and beam column (12) where a workpiece (14), to be processed, is placed in a vacuum chuck (100) to eliminate any irregularity or warpage of the workpiece (14). At this same position, the workpiece (14) is oriented and fixed at a preselected distance from a standard by gap setting means (162, 162b). This distance correlates with a preselected gap (G) between a seal apparatus (16) and the workpiece (14) during workpiece processing. The workpiece (14) and chuck (100) are then moved beneath the seal apparatus (16) and beam column (12) for workpiece processing. After processing, the workpiece (14) and chuck (100) are returned to the loading/unloading position to be removed from the lithography system (10). An interface plate (64) is moved from the loading/unloading position to the workpiece processing position by an X-Y stage (50) and a workpiece transport system (130) is provided to transport the workpieces (14) to and from the lithography system (10) to appropriate cassettes (132,134).
587987
Veneklasen Lee H.
Young Lydia J.
Etec Systems Inc.
Osler Hoskin & Harcourt Llp
LandOfFree
Apparatus for preselecting and maintaining a fixed gap... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for preselecting and maintaining a fixed gap..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for preselecting and maintaining a fixed gap... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1300202