H - Electricity – 01 – J
Patent
H - Electricity
01
J
327/2
H01J 37/32 (2006.01) C23C 16/50 (2006.01) C23C 16/511 (2006.01) H05H 1/46 (2006.01)
Patent
CA 1281082
ABSTRACT The invention relates to an apparatus for producing a plasma and treating substrates therein. The plasma produced by means of microwaves serves to coat a substrate which is situated in a chamber having metal walls. The microwaves are repeatedly reflected by the metal walls so that a number of standing waves are formed with nodes and crests in different positions in the chamber. By means of permanent magnets, which are placed either inside or outside the chamber in the vicinity of the substrate that is to be coated, it is possible to produce within the chamber an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.
552195
Geisler Michael
Kieser Jorg
Rauchle Eberhard
Wilhelm Rolf
Geisler Michael
Kieser Jorg
Leybold Aktiengesellschaft
Rauchle Eberhard
Swabey Ogilvy Renault
LandOfFree
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