H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/147
H01L 21/72 (1980.01)
Patent
CA 1167980
Apparatus for Projecting a Series of Images Onto Dies of a Semiconductor Wafer Abstract An apparatus for forming on a semiconductor wafer unit magnification images of a reticle pattern. A reticle (20-30) containing an image pattern corresponding to the size of the desired wafer pattern is substantially uniformly illuminated (34-47) to produce an image which passes through a one-to-one stationary projection optical system (50-59) to form an image of the reticle pattern at a predetermined focal plane. A selectively positionable vacuum chuck (79-83, 201, 202, 302, 303) holds the wafer. An alignment system (60-78) steps and orients the chuck to register markings on the individual sides of the wafer with the projected image of corresponding markings on the reticle. A fluid servo system (100-139) acts on the chuck to hold at least a portion of the wafer in the predetermined focal plane of the projection optical system.
402954
Hershel Ronald S.
Lee Martin E.
Borden Ladner Gervais Llp
General Signal Corporation
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