Apparatus for semiconductor process including...

Details Apparatus for semiconductor process including... Apparatus for semiconductor process including...

H - Electricity

01

L

356/192, 204/91,

H01L 21/268 (2006.01) C23C 16/44 (2006.01) C23C 16/455 (2006.01) C23C 16/48 (2006.01) H01L 21/20 (2006.01) H01L 21/306 (2006.01)

Patent

CA 1330601

APPARATUS FOR SEMICONDUCTOR PROCESS INCLUDING PHOTO-EXCITATION PROCESS ABSTRACT OF THE DISCLOSURE An apparatus for use in semiconductor fabrication that includes use of a photo- excitation process is provided with a revolving gas chamber at the upper or side part of a gas reaction chamber, an internal or external light source, a partition having a centrally located circular opening provided between the revolving gas chamber and the gas reaction chamber, or the revolving gas chamber is made smaller than the gas reaction chamber. The revolving gas chamber has gas inlets oriented at an angle with respect to the center of the revolving gas chamber to produce a gas flow in one direction to form a laminar flow of gas that revolves and thereby prevents process reactions from contaminating the light source or light transmitting window.

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