C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/00 (2006.01) C23C 16/448 (2006.01)
Patent
CA 2106734
An apparatus supplies CVD coating devices with coating gas and includes an intermediate reservoir for accommoda- tion of the gaseous coating material arranged between a storage tank and a coating device. The volume of the reservoir is set to a predetermined, maximum pressure change in the intermediate reservoir upon withdrawal of the mass of gas required for a coating step. The intermediate reservoir can be connected to a gas recovery station.
Bittner Hans J.
Klein Hans-Jurgen
Kupper Thomas
Morsen Ewald
Marks & Clerk
Schott Glaswerke
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