Apparatus for supplying cvd coating devices

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 16/00 (2006.01) C23C 16/448 (2006.01)

Patent

CA 2106734

An apparatus supplies CVD coating devices with coating gas and includes an intermediate reservoir for accommoda- tion of the gaseous coating material arranged between a storage tank and a coating device. The volume of the reservoir is set to a predetermined, maximum pressure change in the intermediate reservoir upon withdrawal of the mass of gas required for a coating step. The intermediate reservoir can be connected to a gas recovery station.

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