C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/00 (2006.01) C23C 14/56 (2006.01) C23C 16/02 (2006.01) C23C 16/54 (2006.01) H01J 37/32 (2006.01) C23C 14/34 (2006.01) C23C 16/50 (2006.01)
Patent
CA 2363470
Apparatus and method for the vacuum deposition of at least two different layers of thin film material onto a substrate by two different vacuum deposition processes. Also disclosed is a novel linear applicator for using microwave enhanced CVD to uniformly deposit a thin film of material over an elongated substrate.
L'invention concerne un appareil et un procédé permettant de réaliser un dépôt sous vide d'au moins deux couches différentes d'une matière sous forme de film mince sur un substrat au moyen de deux différents procédés de dépôt sous vide. L'invention concerne également un applicateur linéaire permettant d'utiliser un procédé amélioré de dépôt chimique en phase vapeur par micro-ondes afin de déposer uniformément un film mince d'une matière sur un substrat allongé.
Doehler Joachim
Dotter Buddie R. II
Ellison Timothy
Izu Masatsugu
Ovshinsky Herbert C.
Energy Conversion Devices Inc.
Macrae & Co.
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