Apparatus for writing patterns in a layer on a substrate by...

Details Apparatus for writing patterns in a layer on a substrate by... Apparatus for writing patterns in a layer on a substrate by...

H - Electricity

01

L

358/22

H01L 21/423 (2006.01) H01J 37/304 (2006.01)

Patent

CA 1150861

ABSTRACT An apparatus is described for writing patterns in a layer on a substrate by means of a beam of electrically charged particles. The apparatus is provided with an optical height-measuring system for determining a deviation between the desired and the actual position of the surface to be inscribed relative to the charged partical lens system. Said deviation can be measured accurately and continuously without the use of additional markers on the substrate.

353807

Affiliated with

Also associated with

Rating

Apparatus for writing patterns in a layer on a substrate by... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for writing patterns in a layer on a substrate by..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for writing patterns in a layer on a substrate by... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-329418