Application of deuterium oxide in producing silicon...

C - Chemistry – Metallurgy – 08 – G

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C08G 77/22 (2006.01) C03C 1/00 (2006.01) C03C 3/06 (2006.01) C03C 17/25 (2006.01) C09D 183/08 (2006.01) C09J 183/08 (2006.01) G02B 1/00 (2006.01) G02B 6/13 (2006.01)

Patent

CA 2310219

Deuterium oxide, D2O, also called heavy water, was used for the hydrolysis of silanes and metal compounds. The D2O-hydrolyzed silanes polycondense much easier than H2O- hydrolyzed silanes, resulting in a fast Si-O-Si network build up. The most important feature of using D2O is that the final materials are 100% of O-H free and the residual O-D bond does not have absorption peak in the range of 1.0 to 1.8 µm, which is crucial in reducing optical loss at the wavelength of 1.3 and, especially, 1.55 µm. O-H free sol-gel materials with low optical loss have been developed based on the process. The application of D2O can be applied in all kinds of hydrolysis involved processes, such as sol-gel process of silanes and metal compounds, and can be extended into other silica and metal oxides deposition processes, such as flame hydrolysis deposition (FHD) and plasma enhanced chemical vapor deposition (PECVD), wherever water is used.

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