C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/31
C11D 7/50 (2006.01) C23G 5/028 (2006.01) C11D 7/26 (2006.01) C11D 7/28 (2006.01)
Patent
CA 2035687
To replace 1,1,2-trichloro-1,2,2-trifluoroethane (F113) in its applications to the cleaning and drying of solid surfaces, the invention proposes to use a (perfluoroalkyl)-ethylene with the formula RFCH=CH2, in which RF represents a perfluoroalkyl radical, linear or branched, containing 3 to 6 atoms of carbon. Contrary to F113, (perfluoroalkyl)-ethylenes do not damage stratospheric ozone.
Pour remplacer le 1,1,2-trichloro-1,2,2-trifluoroéthane (F113) dans ses applications au nettoyage et au séchage de surfaces solides, l'invention propose d'utiliser un (perfluoroalkyl)-éthylène de formule: RFCH=CH2 dans laquelle RF représente un radical perfluoroalkyle, linéaire ou ramifié, contenant de 3 à 6 atomes de carbone. Contrairement au F113, les (perfluoroalkyl)-éthylènes ne sont pas susceptibles de dégrader l'ozone stratosphérique.
Desbiendras Daniel
Martin Jean-Jacques
Michaud Pascal
Atochem
Robic
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