Aqueous-alkaline developer for negative-working reproduction...

G - Physics – 03 – F

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96/54

G03F 7/32 (2006.01)

Patent

CA 1243876

ABSTRACT Provided is an aqueous-alkaline developer for an irra- diated radiation-sensitive negative-working reproduction layer, which developer is based on water, an anionic surfactant, at least one inorganic salt having an alka- line reaction and at least one alkanoic diacid or a salt thereof, wherein the developer has a pH of from about 8 to 12 and comprises a) 0.05 to 10 % by weight of a sodium, potassium or lithium sulfate salt of octyl, decyl or dodecyl alcohol; b) 0.001 to 5 % by weight of a sodium, lithium or potassium metasilicate salt; c) 0.1 to 15 % by weight of a lithium, potassium or sodium borate salt; d) 0.01 to 5 % by weight of an alkanoic diacid, or sodium or potassium salt thereof having from 2 to 6 carbon atoms; e) 0.5 to 12 % by weight of di- or tri-sodium or potassium phosphate; f) 0.02 to 10 % by weight of a substituted or unsubstituted benzoic acid, or the sodium, potassium, lithium or ammonium salt thereof; and g) 0.5 to 5 % by weight of an ethylene glycol monoether or an ethylene glycol diether, and the weight ratio of sodium ions to potassium ions in the developer ranges from 1:1 to 1.4:1; and a method of developing reproduction layers using the above aqueous alkaline developer.

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