Aqueous-alkaline solution and process for developing...

Details Aqueous-alkaline solution and process for developing... Aqueous-alkaline solution and process for developing...

G - Physics

03

F

96/160, 96/54

G03F 7/32 (2006.01)

Patent

CA 1251678

Abstract of the Disclosure Aqueous-alkaline solution and process for developing positive-working reproduction layers The aqueous-alkaline developer solution for radiation-sensitive, positive-working reproduction layers contains silicate and a quaternary ammonium base, such as tetraalkylammonium hydroxide; it may further contain a salt of an organic, optionally substituted, aromatic monocarboxylic acid, for example, a benzoate. This solu- tion is in particular used for developing reproduction layers which contain an o-naphthoquinone diazide as the radiation-sensitive compound and an alkali-soluble resin and which are applied to a support material based on aluminum, which comprises at least one aluminum oxide layer produced by anodic oxidation.

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