C - Chemistry – Metallurgy – 09 – K
Patent
C - Chemistry, Metallurgy
09
K
31/22
C09K 8/24 (2006.01) C04B 33/00 (2006.01)
Patent
CA 1072315
AQUEOUS CLAY Base MUD FOR DEEP DRILLING Abstract of the disclosure An aqueous clay base mud for deep drilling containing as a protective colloid a copolymer which is constituted by the formula I, II and III Image (I) Image (II) Image (III) in which R2 is hydrogen or -CH3; R3 is -CO-NH2, -CN or COOCH3; R4 is hydrogen, -CH3 or -C2H5; and R5 is -CH3 or -C2H5; or R4 and R5 together represent a propylene group forming a pyrrolidone radical with the inclusion of the radical Image ; Me is ammonium, potassium, sodium or lithium; n is 0 or 1; and x is 5 to 50, y is 25 to 92 and z is 3 to 70, or by saponification products thereof and which contains the components in the parts by weight of the starting monomers indicated by the indices x, y and z.
235339
Engelhardt Friedrich
Hille Martin
Ulmschneider Dieter
Hoechst Aktiengesellschaft
Na
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