C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/722 (2006.01) B08B 3/08 (2006.01) C09D 9/04 (2006.01) C11D 1/44 (2006.01) C11D 1/72 (2006.01) C11D 1/825 (2006.01) C11D 1/835 (2006.01) C11D 3/20 (2006.01) C11D 3/37 (2006.01) C11D 11/00 (2006.01) C23G 1/24 (2006.01) C23G 5/00 (2006.01) H05K 3/26 (2006.01) H05K 3/30 (2006.01)
Patent
CA 2352240
A process for the use of an aqueous cleaning composition to remove organic material from a substrate. The cleaning composition preferably includes a nonionic surfactant and may also include a glycol ether solvent.
La présente invention concerne un procédé d'utilisation d'une composition de nettoyage aqueuse permettant d'éliminer un matériau organique d'un substrat. Cette composition de nettoyage contient de préférence un tensio-actif non ionique et peut également contenir un solvant d'éther glycolique.
Bivins Elizabeth A.
Hayes Michael E.
Prieto Nelson E.
Starkweather Byron A.
Petroferm Inc.
Torys Llp
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