C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
C08L 77/06 (2006.01) C08G 69/26 (2006.01) C08G 69/28 (2006.01) C08L 91/06 (2006.01) C09D 177/08 (2006.01)
Patent
CA 2158144
An aqueous cold seal release varnish comprising the reaction product of a mixture comprising 30-50 parts of a polyamide block copolymer having an acid value of 30-45, 1-5 parts of an amide wax, 10-20 parts of at least one C1-C4 alkanol, 5-10 parts of an amine and 15-55 parts of water. The mixture is dissolved by heating at a temperature of 75°-85°C for a period of time of not more than 90 minutes to produce a varnish. An aqueous cold seal release lacquer (CSRL) is prepared from the varnish by mixing with a C1-C4 alkanol, water and a surfactant.
Adhikari Prasad K.
Catena Robert J.
Mccarthy Tetrault Llp
Sun Chemical Corporation
LandOfFree
Aqueous cold seal release lacquer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Aqueous cold seal release lacquer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aqueous cold seal release lacquer will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1581889