Aqueous developer containing nonionic surfactant and salts...

Details Aqueous developer containing nonionic surfactant and salts... Aqueous developer containing nonionic surfactant and salts...

G - Physics

03

F

96/266, 96/58

G03F 7/32 (2006.01)

Patent

CA 1165610

IMPROVEMENTS IN OR RELATING TO THE PROCESSING OF RADIATION SENSITIVE PLATES ABSTRACT OF THE DISCLOSURE A developer for processing image-wise exposed negative-working radiation sensitive plates based on organic solvent soluble diazo resins or certain photocrosslinkable resins or photopolymerisable olefinically unsaturated compounds includes a surfactant and a salt of an aliphatic carboxylic acid containing up to nine carbon atoms, The developer is substantially aqueous and has a reduced tendency to foam formation. It is useful in the photomechanical production of lithographic printing plates.

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