Aqueous developer solution for positive-working photoresists

Details Aqueous developer solution for positive-working photoresists Aqueous developer solution for positive-working photoresists

G - Physics

03

F

96/65

G03F 7/32 (2006.01)

Patent

CA 1335338

An aqueous developer solu- tion contains, as a water-soluble basic compound, a com- pound of the general formula (I) Image (I) where R1 to R5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl. It is suitable for developing positive-working photoresists.

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