Aqueous developing solutions for reduced developer residue

Details Aqueous developing solutions for reduced developer residue Aqueous developing solutions for reduced developer residue

G - Physics

03

F

G03F 7/32 (2006.01)

Patent

CA 2266609

An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula: R-(O-(CH2-CH2-O)n]m-X (I) where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 15, preferably at least about 20, more preferably at least about 30.

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