C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
6/221, 402/364,
C08G 73/02 (2006.01) C07C 211/50 (2006.01) C08G 73/12 (2006.01)
Patent
CA 1312875
27981-2 ABSTRACT OF THE DISCLOSURE Disclosed herein is an aromatic amine resin formed of a mixture of aromatic amine compounds represented by the following general formula (a): Image (a) [wherein A means a phenylene, alkyl-substituted phenylene, diphenylene, diphenyl ether or naphthylenyl group, R1 denotes a halogen atom or a hydroxyl, C1-4 alkoxy or C1-5 alkyl group, ? stands for 1 or 2, m is an integer of 0-3, when m is 2 or 3, R1s may be the same or different and two of R1s may together form a 5- to 6-membered alicyclic moiety which may optionally contain one or more side chains, and n stands for an integer of 0-300]. The aromatic amine compounds (a) are useful in a wide variety of fields, for example, as raw materials of epoxy resins, curing agents for other epoxy compounds, raw materials of maleimide resins, curing agents for other maleimide resins, among others.
579570
Ohta Masahiro
Tanabe Yoshimitsu
Urakami Tatsuhiro
Yamaguchi Akihiro
Yamaguchi Keizaburo
Fetherstonhaugh & Co.
Mitsui Toatsu Chemicals Inc.
Ohta Masahiro
Tanabe Yoshimitsu
Urakami Tatsuhiro
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