C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 13/00 (2006.01) A61K 51/00 (2006.01) A61K 51/04 (2006.01) C07C 211/50 (2006.01) C07C 211/53 (2006.01) C07C 229/54 (2006.01) C07C 229/60 (2006.01) C07C 229/64 (2006.01) C07C 233/43 (2006.01) C07C 239/08 (2006.01) C07C 239/16 (2006.01) C07C 239/18 (2006.01) C07C 323/34 (2006.01) C07C 323/63 (2006.01) C07D 257/02 (2006.01) C07D 257/10 (2006.01) C07D 285/00 (2006.01) C07D 513/04 (2006.01) C07F 15/00 (2006.01)
Patent
CA 2190727
The present invention provides aromatic amine substituted metal chelating compounds of formula (I) in which the variables are as defined in the claims, chelates and chelate-targeting moiety conjugates formed from the chelating compounds, and methods for making these compounds. Metals capable of being chelated by the chelating compounds include radionuclides, such as 99mTc and 186/188Re.
L'invention concerne des composés de chélation de métal substitués par amines aromatiques de la formule dans laquelle les variables ont la notation mentionnée dans les revendications. L'invention concerne également des chélates et des conjugués de fragments chélateurs formés à partir de composés de chélation, ainsi que des procédés permettant de préparer lesdits composés. Les métaux aptes à être chélatés par les composés de chélation comprennent des radionuclides tels que ?99m¿Tc et ?186/188¿Re.
Kasina Sudhakar
Reno John M.
Yau Eric
Gowling Lafleur Henderson Llp
Neorx Corporation
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