C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/211, 167/246
C07C 233/65 (2006.01) A61K 31/165 (2006.01) A61K 31/395 (2006.01) C07C 233/66 (2006.01) C07C 233/75 (2006.01) C07C 235/56 (2006.01) C07D 295/092 (2006.01) C07D 295/155 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2020887
RAN 4060/153 Abstract The compounds of the general formula Image I wherein R1 represents hydrogen, halogen or OR5; R2 represents hydrogen, lower-alkyl, lower-alkoxy or halogen: R3 and R4 each independenely represent lower-alkyl or taken together represent alkylene with 3-5 C atoms in a straight-chain; R5 signifies hydrogen, acyl, lower-alkoxycarbonyl or lower-alkyl, which can be substituted by amino, mono-alkylamino, di-alkylamino or a residue -N-Het; -N-Het signifies a 5-8-membered, saturated or unsaturated monocyclic heterocycle attached via a N atom; and M signifies -CONH- or -NHCO-, can be used as medicaments, e.g. for ehe treatment of neoplasms and dermatological indications of an inflammatory and allergic nature.
Klaus Michael
Mohr Peter
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
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