C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
402/297, 400/505
C07D 207/452 (2006.01) C07C 205/38 (2006.01) C07C 217/90 (2006.01) C08G 69/26 (2006.01) C08G 73/12 (2006.01) C08L 39/04 (2006.01)
Patent
CA 2028313
Disclosed is an aromatic diamine compound represented by the formula (I) ) (see fig. I) wherein R is H or CH3. Also disclosed is a bismaleimide compound represented by the formula (IV) (see fig. IV) wherein R is H or CH3, A resin forming composition comprising these compounds is also disclosed. The compounds are useful as raw materials for resins, and the resin forming composition and the resin can provide excellent heat resistance and impact resistance and low hygroscopicity.
Ohta Masahiro
Tamai Shoji
Tanabe Yoshimitsu
Urakami Tatsuhiro
Yamaguchi Akihiro
Fetherstonhaugh & Co.
Mitsui Chemicals Incorporated
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