Arrangement and photometer for measuring and controlling the...

G - Physics – 01 – B

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32/3, 73/57

G01B 11/06 (2006.01) C23C 14/54 (2006.01) G05D 5/03 (2006.01)

Patent

CA 1082486

ABSTRACT OF THE DISCLOSURE The specification describes an arrangement for measuring and controlling the thickness of optically active thin layers during formation in vacuum coating installations The arrange- ment operates by detecting the reflection and transmission behaviour of layer thicknesses between fractions and multiples of the wavelength of an essentially monochromatic measure- ment light. The coating process is interrupted when a pre- determined layer thickness has been obtained. The arrangement consists of a measurement light source for emitting a focused measurement light beam, a chopper device, a beam divider arranged at an angle of 45 degrees on the axis of the measure- ment light beam with that part of the measurement light beam passing behind the beam divider being directed on the measure- ment object, a measurement light receiver provided with a monochromator, a differentiation device for the measurement of signal and an interruption device for the coating process. The axis of the measurement light beam emitted from the light source is orientated towards the measurement object and a reference light receiver independent of the optical properties of the measurement object is associated with the measurement light beam. The output signal of the reference light receiver is mixed with a trigger stage for a phase-sensitive photometer amplifier. The signal is fed to a compensation circuit for the equalization of brightness variations in the measurement light source.

280674

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