Arrangement for and method of saturating a gas with the...

B - Operations – Transporting – 01 – F

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B01F 3/04 (2006.01) B01J 4/00 (2006.01) C03B 37/014 (2006.01)

Patent

CA 1193962

ABSTRACT: An arrangement for saturating a gas with the vapour of a liquid is formed by two chambers. In the first chamber the gas is passed through the liquid which has a higher temperature than the temperature at which the gas must ultimately have been saturated on leaving the arrangement. Thereafter, the gas is passed into a second chamber. The liquid in said chamber has the temperature at which the gas must be saturated.

401433

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