G - Physics – 03 – C
Patent
G - Physics
03
C
96/162
G03C 1/60 (2006.01) G03C 1/74 (2006.01) G03F 7/016 (2006.01) G03F 7/16 (2006.01)
Patent
CA 1247917
ARTICLES HAVING STABILIZED PHOTOSENSITIVE DIAZO RESIN Abstract of the Disclosure Plates such as those used in lithographic printing and photoresists such as those used in preparing printed circuit boards and the like are provided with a photopolymerizable photosensitive diazo resin that is unusually stable. The diazo resin is laid down from a stabilized diazonium composition that is an emulsion including the selected diazo resin, a purine derivative, especially a theophylline derivative, preferably in combination with a salt of a low molecular weight alkyl sulfonic acid or other supplementary stabilizer component.
453193
Amariti Luigi
Santos Llandro C.
Imperial Metal & Chemical Company
Osler Hoskin & Harcourt Llp
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