C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/278.2, 260/2
C07D 211/58 (2006.01) C07D 401/00 (2006.01) C07D 401/12 (2006.01)
Patent
CA 1141385
ABSTRACT OF THE DISCLOSURE The present invention provides aryl ether derivatives of the formula: Image wherein A is an oxygen atom or the group ?-R1, in which R1 is a hydrogen atom or a lower alkyl radical, R2 and R3, which can be the sane or different, are hydrogen atoms of lower alkyl radicals, R4 is a hydrogen atom or a hydroxyl group R5 is a hydrogen atom or an acyl radical, R7 is a hydrogen atom, a lower alkyl radical or a lower alkanoyl radical and R8 is a hydrogen atom, a lower alkyl radical, a lower alkoxy radical or a hydroxyl group, and the pharmaceutically acceptable, pharmacologically compatible salts thereof, the present invention also provides a process for the preparation of these compounds and pharmaceutical compositions containing them, the novel derivatives can be used for combating allergic diseases, and a significantly lesser amount of the new derivatives is required in order to achieve a comparable inhibition of the passive cutaneous anaphylactoid reaction as compared with the commercially available diethylcarbamazine.
342965
Friebe Walter-Gunar
Roesch Androniki
Thiel Max
Wilhelms Otto-Henning
Winter Werner
Boehringer Mannheim G.m.b.h.
Sherman
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