C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/208, 260/305
C07D 233/56 (2006.01) C07D 249/08 (2006.01) C07D 405/06 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1334196
Arylmethylazoles of the formula I Image in which Aryl is (substituted) phenyl or naphthyl; Z is CH or N; R1 and Q are H or alkyl; R2 is H, alk(en)yl or alkynyl; R3 and R4 are H, alkyl or other hydrocarbons; or R3 and R4 together are a -(CH2)2-11 chain or a bridged -(CH2)4-5 chain, and their acid addition salts, stereoisomers and optically active enantiomers possess outstanding antimycotic and antidepressant activity. The compounds of the Formula I are obtained, inter alia, from arylmethylazoles II Image II which are reacted with a strong base and then with a car- bonyl compound III 0=CR3R4; thereafter, the product is reacted with the protic acid or with an alkyl halide IV R2Hal. If desired, the products are converted to the acid addition salts, or the stereoisomers or optically active enantiomers are resolved.
518739
Alpermann Hans Georg
Dittmar Walter
Gerhards Hermann Josef
Kampe Klaus-Dieter
Leven Margret
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Hoechst Aktiengesellschaft
LandOfFree
Arylmethylazoles and their salts, processes for their... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Arylmethylazoles and their salts, processes for their..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Arylmethylazoles and their salts, processes for their... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1227108