C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 9/141 (2006.01) C07F 9/145 (2006.01) C07F 9/146 (2006.01) C07F 9/59 (2006.01) C08K 5/524 (2006.01) C08K 5/526 (2006.01) C08L 101/00 (2006.01)
Patent
CA 2063852
Compounds of the formula I (See formula I) in which x is 1, 2 or 3, and, if x = 1, R1 is C1-C30alkyl, C1-C18alkyl substituted by halogen, -COOR2, -CN, - NR3R4 or by -CONR3R4, C2-C18alkyl which is interrupted by -NR5-, -O- or -S-, C3- C18alkenyl, C5-C12cycloalkyl, phenyl-C1-C4alkyl, phenyl which is unsubstituted or substituted by halogen, phenyl-C1-C4alkyl or C1-C4alkoxy, or R1 is naphthyl, a radical of the formula (See formula II, III or IV) R2, R3, R4 and R5, independently of one another, are hydrogen, C1-C18alkyl, C5-C12cycloalkyl or phenyl-C1-C4alkyl, R6 is hydrogen, methyl, allyl or benzyl, R7 is hydrogen or -OR9, R8 is hydrogen or methyl, R9 is hydrogen or C1-C30alkyl, R10 and R11, independently of one another, are hydrogen or C1-C8alkyl, and n is 3-6, with the proviso that R1 is not a phenyl radical which is substituted in both ortho-positions to the carbon atom bonded to the oxygen atom, if x = 2, R1 is C2-C18alkylene which is interrupted by -NR5-, -O- or -S-, or is a (See formula V) radical, and, if x = 3, R1 is C4-C12alkanetriyl or a (See formula VI) group in which m is 1- 4, are suitable as stabilisers for organic materials which are sensitive to thermal, oxidative and/or photoinduced degradation.
Hofmann Peter
Maul Rudolf
Pitteloud Rita
Schenk Volker
Troxler Eduard
Ag Ciba-Geigy
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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