Auto-photocrosslinkable copolyimides and polyimide compositions

C - Chemistry – Metallurgy – 08 – G

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96/172, 402/221,

C08G 73/10 (2006.01) C08L 79/08 (2006.01) G03C 11/08 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1295774

Auto-photocrosslinkable copolyimides and polyimide compositions Abstract The present invention relates to copolyimides of 100-70 mol % of recurring structural units of the formula I and 0-30 mol % of recurring structural units of the formula II Image (I), Image (II), in which Za is a tetravalent aromatic tetracarboxylic acid radical other than that of thioxanthonetetracarboxylic acid, the carboxyl groups thereof in each case being located in pairs in the ortho-position or peri-position relative to one another, and Xa is a divalent aromatic diamine radical which, in at least one ortho-position relative to at least one nitrogen atom, carries a hydrocarbon substituent having at least one aliphatic .alpha.-hydrogen atom or Xa is a radical of the formula III Image (III), in which Xc is a divalent aromatic diamine radical which, in ortho-position relative to both nitrogen atoms, carries in each case at least one mono- valent hydrocarbon substituent having at least one aliphatic .alpha.-hydrogen atom, ? assumes an average value of 1.0 to 2.5, Zb is as defined for Za and Xb is an aliphatic, cycloaliphatic, aromatic or araliphatic diamine radical, excluding a radical of the formula III, with the proviso that the proportion of radicals of the formula III in the formula I is selected such that the quantity of thioxanthonetetracarboxylic acid radicals, relative to the total quantity of tetracarboxylic acid units in the copolyimide, is between 1 and 30 mol %. These copolyimides have a high radiation-sensitivity and can be combined with structurally related polyimides to form photocrosslinkable compo- sitions which can be employed for coating purposes.

585713

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