Automatic etch-pit counting system

Details Automatic etch-pit counting system Automatic etch-pit counting system

G - Physics

01

R

356/118

G01R 31/26 (2006.01)

Patent

CA 1217573

Abstract The present invention is a method of counting auto- matically the number of etch pits by using a computerized image-processing technique, which comprises the steps of calculating the average unit area Ap of an isolated etch pit p on the surface of a semiconductor crystal substrate (wafer) for every wafer or at every measured point thereon, dividing the area Sk of a grouping of overlapping etch pits k by the average unit area Ap, rounding off the quotient to be an integer so as to obtain the number of etch pits nk included in the area Sk, and totaling the number of isolated etch pits u and the number of overlapping etch pits nk to obtain the total number of etch pits N on the wafer surface, so that the etch pits density on the wafer surface can be calculated.

464853

Affiliated with

Also associated with

Rating

Automatic etch-pit counting system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Automatic etch-pit counting system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automatic etch-pit counting system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1194662