Automatic focused ion beam imaging system and method

Details Automatic focused ion beam imaging system and method Automatic focused ion beam imaging system and method

G - Physics

01

R

G01R 31/303 (2006.01) G01N 23/225 (2006.01) G01R 31/307 (2006.01) H01J 37/28 (2006.01)

Patent

CA 2260440

A method of imaging an integrated circuit using a focused ion beam system is presented. According to the method an integrated circuit is imaged in plan- view using a focused ion beam system. Circuit information is then extracted absent processing. In another embodiment, a method and system for imaging an entire IC automatically without removing the IC from the imaging system and requiring minimal operator intervention is presented. The method employs a focused ion beam system to image an exposed layer of an integrated circuit and then to etch a portion of the exposed layer in situ. Imaging and etching are repeated until substantially the entire integrated circuit is imaged. A processor is used to assemble the layers into a three-dimensional topography of the integrated circuit. Because of known relationships between layers, the mosaicing is facilitated and the final topography is more reliable than those produced by currently known computer implemented methods.

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