B - Operations – Transporting – 05 – C
Patent
B - Operations, Transporting
05
C
32/2
B05C 11/10 (2006.01) B05C 3/109 (2006.01) C23C 14/22 (2006.01) C23C 14/54 (2006.01)
Patent
CA 1185782
TITLE AUTOMATIC VARIABLE RATE EVAPORATION SOURCE FOR THIN FILM DEPOSITION INVENTOR Germain Boivin ABSTRACT OF THE DISCLOSURE An apparatus for automatically controlling the rate of vacuum deposition of thin films on a substrate, consisting of an optical diaphragm or shutter in the form of two apertured plates placed between the evaporation crucible and a substrate which are moved in opposite directions to vary the size of the opening through which the evaporated material must pass to be deposited on the substrate. The rate of evaporation is sensed by a quartz crystal and this signal is compared to a reference signal. The difference between the two signals is used to control the movement of the apertured plates thereby correcting the rate of deposition of the thin film.
420009
Canadian Patents And Development Limited - Societe Canadienne De
Hendry Robert G.
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