C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 205/04 (2006.01) A61K 31/397 (2006.01) A61K 31/496 (2006.01) A61P 1/00 (2006.01) A61P 9/00 (2006.01) A61P 11/00 (2006.01) A61P 25/00 (2006.01) C07D 401/06 (2006.01) C07D 401/12 (2006.01) C07D 403/12 (2006.01) C07D 403/14 (2006.01) C07D 471/04 (2006.01) C07D 487/04 (2006.01)
Patent
CA 2721303
The invention relates to compounds of formula (I) wherein R, R0, R1, m, n and X1 to X4 have the meaning as cited in the description and the claims. Said compounds are useful as Histamine H3 receptor antagonists. The invention also relates to pharmaceutical compositions, the preparation of such compounds as well as the production and use as medicament.
La présente invention concerne des composés de formule (I) dans laquelle R, R0, R1, m, n et X1 à X4 ont la signification donnée dans la description et les revendications. Lesdits composés sont utiles comme antagonistes des récepteurs H3 de lhistamine. Linvention concerne également des compositions pharmaceutiques, la préparation de tels composés ainsi que leur production et leur utilisation comme médicament.
Corsi Massimo
Davenport Adam James
Hallett David James
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Evotec Ag
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