C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/273
C07D 471/04 (2006.01) A61K 31/395 (2006.01) C07D 498/04 (2006.01) C07D 513/04 (2006.01)
Patent
CA 2020006
ABSTRACT OF THE DISCLOSURE Compounds of the general formula (I): Image (I) and pharmaceutically acceptable salts thereof, in which A, B, C and D each represent -CH= or -N=, with the proviso that at least one of them is -N=; X represents -NH-, -O- or -S-; Y represents -(CH2)p- wherein p is an integer from 0 to 4, -C(CH3)2-, -CH2CH=CH-, -CH2CO-, -CF2- or -CH2COCH2-; R1 represents a hydrogen atom, a C1-4 alkyl group, a halogen atom or a C1-4 alkoxy group; R2 represents a hydrogen atom, a hydroxyl group, a saturated or unsaturated C1-6 alkyl group, a C1-6 alkoxy group, a carboxyl group, a saturated or unsaturated C1-12 alkoxycarbonyl group which may be optionally substituted, a cycloalkoxycarbonyl group, a saturated or unsaturated five- or six-membered heterocyclic group containing at least one nitrogen atom optionally with one or more nitrogen and/or oxygen atoms, which may be optionally condensed and/or substituted, -CONR3R4, -NR3R4, -OCOR3 or -NHCONHR3 wherein R3 and R4, which may be the same or different, represent a C1-6 alkyl group which may be optionally substituted or a cycloalkyl group, and m and n each represent an integer from 0 to 2.
Hirano Fumiya
Inouye Shigeharu
Katano Kiyoaki
Konno Fukio
Machinami Tomoya
Fetherstonhaugh & Co.
Meiji Seika Kabushiki Kaisha
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