C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/233, 260/305
C07D 405/06 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1244039
Abstract of the Invention A compound of the formula: Image (wherein Az is imidazolyl or triazolyl; R is C1-C5 alkyl or phenyl optionally substituted by 1 to 3 members selected from halogen, C1-C5 alkyl, and C1-C5 alkoxy; X1 and X21 each is hydrogen, halogen, C1-C5 alkyl, or C1-C5 alkoxy; Y is C=O, C-S, S=O, or R1-C-R2; and R1 and R2 each is hydrogen, C1-C3 alkyl or, taken together may form C4-C6 alkylene) or its acid addition salt being useful as an antimycotic agent is prepared by reacting a corresponding diol with a cyclizing agent.
459425
Kida Shiro
Matsumoto Hiroshi
Ogata Masaru
Tawara Katsuya
Johnson Douglas S. Q.c.
Shionogi & Co. Ltd.
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