C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/313, 260/315
C07D 233/60 (2006.01) A01N 43/50 (2006.01) A01N 43/64 (2006.01) A01N 43/653 (2006.01) C07D 249/08 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1185608
ABSTRACT OF THE DISCLOSURE Azolyl-alkenones and -ols of the general formula Image in which R1 represents all alkyl radical, a halogenoalkyl radical or a phenyl radical, which phenyl radical is optionally monosub- stituted or polysubstituted by identical or different substituent(s) selected from halogen, alkyl having 1 to 4 carbon atoms, alkoxy and alkylthio, each having 1 to 4 carbon atoms, alkylamino and dialkylamino, each having 1 to 4 carbon atoms in each alkyl part, and also halogenoalkyl, halogenoalkoxy and halogenoalkylthio, each having 1 or 2 carbon atoms and 1 to 5 identical or different halo- gen atoms, phenyl and phenoxy, it being possible for the two last- mentioned radicals in turn to be substituted by halogen and/or alkyl having 1 or 2 carbon atoms; R2 represents an alkyl radical, a phenyl radical, which phenyl radical is optionally monosubsti- tuted or polysubstituted by identical or different substituents selected from halogen, alkyl having 1 to 4 carbon atoms, alkoxy and alkylthio, each having 1 to 4 carbon atoms, alkylamino and dialkylamino, each having 1 to 4 carbon atoms in each alkyl part, and also halogenoalkyl, halogenoalkoxy and halogenoalkylthio, each having 1 or 2 carbon atoms and 1 to 5 identical or different halo- gen atoms, phenyl and phenoxy, it being possible for the two last- mentioned radicals in turn to be substituted by halogen and/or alkyl having 1 or 2 carbon atoms, a cycloalkyl radical which cyclo- alkyl radical is optionally substituted by halogen and/or alkyl having 1 to 4 carbon atoms or a cycloalkylalkyl radical which cyclo- alkylalkyl radical is optionally substituted by halogen and/or alkyl having 1 to 4 carbon atoms; X represents a CO or CH(OH) group; and Y represents a nitrogen atom or a CH group; and their acid addi- tion salts and metal salt complexes are new, are prepared as des- cribed and find use as plant-growth regulators and fungicides.
415219
Buchel Karl H.
Elbe Hans-Ludwig
Frohberger Paul-Ernst
Lurssen Klaus
Buchel Karl H.
Elbe Hans-Ludwig
Fetherstonhaugh & Co.
Frohberger Paul-Ernst
Lurssen Klaus
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