C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305, 167/9,
C07D 405/06 (2006.01) A01N 43/50 (2006.01) A01N 43/653 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1271764
ABSTRACT OF THE DISCLOSURE: The invention relates to new compounds of the formula Image where R is C1-C4-alkyl, naphthyl, biphenyl or phenyl, and the phenyl radical may be substituted by halogen, nitro or phenoxy or by alkyl, alkoxy or haloalkyl, each of 1 to 4 carbon atoms, Hal is fluorine, chlorine or bromine and =Z- is =CH- or =N-, and to their plant-tolerated addition salts with acids and metal salts, which possess a better fungicidal action than the known azole compounds, in particular against cereal diseases.
504240
Ammermann Eberhard
Janssen Bernd
Karbach Stefan
Meyer Norbert
Pommer Ernst-Heinrich
Basf Aktiengesellschaft
Robic Robic & Associes/associates
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