C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305, 260/304
C07D 405/06 (2006.01) A01N 43/50 (2006.01) A01N 43/64 (2006.01) C07C 17/26 (2006.01) C07D 303/08 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1204117
ABSTRACT OF THE DISCLOSURE: Compounds of the formula Image where A and B are identical or different and are each alkyl of 1 to 4 carbon atoms, naphthyl, biphenyl or phenyl, and the phenyl radical can be substituted by halogen, nitro, alkyl of 1 to 4 carbon atoms, alkoxy of 1 to 4 carbon atoms, haloalkyl of 1 to 4 carbon atoms, phenoxy or phenylsulfonyl, and Z is CH or a nitrogen atom, and their physiologically or pharmaceutically acceptable addition salts with acids, and their preparation are described. The compounds are useful antimycotics.
426058
Heberle Wolfgang
Janssen Bernd
Kohlmann Friedrich-Wilhelm
Meyer Norbert
Wesenberg Walter
Basf Aktiengesellschaft
Robic Robic & Associes/associates
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