Bakeable aqueous photopolymer

Details Bakeable aqueous photopolymer Bakeable aqueous photopolymer

C - Chemistry, Metallurgy

08

G

96/158, 402/2, 1

C08G 83/00 (2006.01) C08G 63/685 (2006.01) C08G 85/00 (2006.01) G03F 7/008 (2006.01) G03F 7/012 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2022163

A radiation-sensitive compound comprises a polymer including a plurality of azide-substituted aromatic ester groups and a plurality of carboxylic or sulphonic acid groups capable of imparting to the compound solubility in aqueous or alkaline medium. After image-wise exposure, the compound can be developed using an aqueous or alkaline developer. The compound is useful in the production of radiation sensitive plates for the manufacture of lithographic printing plates which can be baked to improve printing life.

L'invention est une substance sensible aux radiations qui est constituée d'un polymère contenant une pluralité de groupes d'ester aromatique à substitution azide et une pluralité de groupes d'acide carboxylique ou sulphonique pouvant rendre cette substance soluble en milieu aqueux ou alcalin. Après l'exposition photographique, la substance peut être développée au moyen d'un révélateur aqueux ou alcalin. La substance est utile dans la production de plaques sensibles aux radiations utilisées dans la fabrication de planches d'impression lithographiques qui peuvent être soumises à la cuisson pour accroître la durée de vie des impressions.

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