Basic benzyloxyalkyl derivatives

C - Chemistry – Metallurgy – 07 – C

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260/603.1

C07C 93/14 (1980.01)

Patent

CA 1085422

A B S T R A C T The invention is concerned with benzyloxyalkyl derivatives of the formula: Image wherein X is a hydrogen or halogen atom; R1 is an alkyl having up to 4 carbon atoms; R2 and R3, which can be the same or different, are alkyl radicals containing up to 4 carbon atoms or R2 and R3, together with the nitrogen atom to which they are attached, is a heterocyclic ring; and n is 2 or 3; and their pharmacologically compatible salts. These novel compounds possess anti-phlogistic and analgesic properties and can also be used to inhibit inflammation.

260655

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