C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/603.1
C07C 93/14 (1980.01)
Patent
CA 1085422
A B S T R A C T The invention is concerned with benzyloxyalkyl derivatives of the formula: Image wherein X is a hydrogen or halogen atom; R1 is an alkyl having up to 4 carbon atoms; R2 and R3, which can be the same or different, are alkyl radicals containing up to 4 carbon atoms or R2 and R3, together with the nitrogen atom to which they are attached, is a heterocyclic ring; and n is 2 or 3; and their pharmacologically compatible salts. These novel compounds possess anti-phlogistic and analgesic properties and can also be used to inhibit inflammation.
260655
Herrmann Manfred F.r.
Satzinger Gerhard
Goudreau Gage & Associates
Herrmann Manfred F.r.
Satzinger Gerhard
LandOfFree
Basic benzyloxyalkyl derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Basic benzyloxyalkyl derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Basic benzyloxyalkyl derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1018173