C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/241.15
C07D 487/04 (2006.01) C07C 29/147 (2006.01) C07C 45/30 (2006.01) C07C 51/347 (2006.01) C07D 207/34 (2006.01) C07D 209/94 (2006.01)
Patent
CA 1202970
ABSTRACT Compounds of the formula Image I wherein R1 and R3 are hydrogen, lower alkyl, hydroxy, lower alkoxy or acyloxy and R2 and R4 are hydrogen or R1 and R2 and/or R3 and R4 taken together are oxo groups with the proviso that at least one oxo group is present; R is hydrogen, lower alkyl, C2 to C7 carboxylic acids and the esters and amides thereof, hydroxy C2 to C7 alkyl, amino C2 to C7 alkyl or mono- or di-lower alkyl amino C2 to C7 alkyl; R5 is halogen having an atomic number not greater than 35 or hydrogen; and R6 is halogen having an atomic number not greater than 35 with the proviso that when R1 or R3 is hydroxy, lower alkoxy or acyloxy, then R is lower alkyl or hydrogen and the N-oxides and the pharmaceutically acceptable salts thereof exhibit activity as sedative and anxiolytic agents.
428213
Fryer Rodney I.
Trybulski Eugene J.
Walser Armin
Gowling Lafleur Henderson Llp
Hoffmann-La Roche Limited
LandOfFree
Benzazepine derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Benzazepine derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Benzazepine derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1264970