C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 261/20 (2006.01) A61K 31/495 (2006.01) A61K 31/55 (2006.01) C07D 231/56 (2006.01) C07D 403/04 (2006.01) C07D 413/04 (2006.01)
Patent
CA 2218663
This invention relates to compounds of formula (I), wherein X, Y, Z, m, n and p are as defined within, pharmaceutical compositions containing these compounds and to their use as antipsychotic agents, particularly in the treatment of schizophrenia. Depot derivatives of the compounds are useful for providing long acting effects of the compounds.
L'invention concerne des composés ayant la formule (I), dans laquelle X, Y, Z, m, n et p sont définis dans la description. L'invention concerne également des compositions pharmaceutiques contenant ces composés et leur utilisation comme agents neuroleptiques, en particulier pour le traitement de la schizophrénie. Des préparations à effet retard sont utiles pour prolonger l'effet de ces composés.
Martin Lawrence L.
Nemoto Peter A.
Palermo Mark G.
Aventis Pharmaceuticals Inc.
Hoechst Marion Roussel Inc.
Osler Hoskin & Harcourt Llp
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