C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 413/06 (2006.01) A61K 31/435 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) A61K 31/55 (2006.01) C07D 401/12 (2006.01) C07D 413/12 (2006.01) C07D 413/14 (2006.01) C07D 498/04 (2006.01)
Patent
CA 2116117
Abstract of the Disclosure Benzisoxazole compounds and pharmaceutically acceptable salts thereof, having the formula Image wherein when Image bond between 2- and 3-positions is a single bond, Ra is a group of the formula Image [wherein R is hydrogen, alkyl, alkenyl, cycloalkylalkyl, cyclo- alkylalkenyl, phenylalkyl, phenylalkenyl, naphthylalkyl or naphthyl- alkenyl, A is a straight- or branched chain alkylene, and n is 1, 2 or 3], and Rb is oxygen, and when Image bond between 2- and 3 positions is a double bond, Ra is void and Rb is a group of the formula Image [wherein each symbol is as defined above] or a group of the formula Image [wherein E is oxygen or sulfur and other symbols are as defined above]; and R1, R2, R3 and R4 are as defined in the Specification. The compounds of the present invention inhibit acetylcholinesterase in the central nervous system potently and selectively and/or have strong affinity for sigma receptor. 105
Murakami Shu
Sueoka Hiroyuki
Takehara Shuzo
Fetherstonhaugh & Co.
Yoshitomi Pharmaceutical Industries Ltd.
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